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Liquid source misted chemical deposition (LSMCD) uses micron sized droplets of precursor solution to produce thin films. As with other chemical solution methods, adjusting the composition of precursor solution can easily achieve the desired composition of final film. And the small droplet size is expected to give better step coverage. In this study, lead zirconate titanate (PZT) thin films were prepared...
The needs for high quality, multi-component thin film are ever increasing with the progress of semiconductor technology. Liquid source misted chemical deposition (LSMCD) is a promising method for thin film preparation. However, the details of the characteristics of the droplets before depositing on the substrate have not been clearly understood. In this study, the effect of the solute on the droplet...
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