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In this work, high quality titanium dioxide thin films were grown by an efficient, less expensive and rapid method of Atmospheric Pressure Chemical Vapor Deposition (APCVD) from TiCl4 precursor for application as antireflection coatings on monocrystalline silicon solar cells with the aim to reduce the front surface reflection losses. The microstructural, electrical and optical properties of the produced...
This paper presents an efficient and less expensive method to fabricate high quality titanium dioxide (TiO2) thin films by APCVD technique using TiCl4 as precursor for application as antireflection coatings on monocrystalline silicon solar cells. The structural, electrical and optical properties of the produced coatings were successfully characterized by Atomic Force Microscopy (AFM), Four Point Probe...
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