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The RF magnetron sputtered indium tin oxide (ITO) films were deposited on glass substrates with low resistivity, high transmittance and work function for various oxygen (O 2 ) flow rates. The addition of small O 2 contents during the sputtering process increased the Hall mobility of ITO films while carrier concentration was decreased. The work function of ITO films was enhanced from...
ITO and ITO:Zr films with various thicknesses were prepared on glass substrates by RF magnetron sputtering. We observed a decrease in sheet resistance with increasing film thickness that in good agreement with Fuchs-Sondheimer theory. The ITO films doped with ZrO2 (∼0.2 wt%) showed improvement in some of the electrical and optical properties of ITO films. The surface roughness of ITO:Zr films increased...
Inductive coupled plasma-reactive ion etching (ICP-RIE) offers an anisotropic texturing with superior surface structure of glass substrate. We report light trapping scheme of ICP-RIE glass texturing by SF 6 /Ar plasma. We observed that surface structure is an important factor to improve the diffused transmittance and haze ratio of textured glass. The presence of metal elements like Al, B,...
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