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Bias-assisted hot filament chemical vapour deposition (HFCVD) and ion-assisted pulsed laser deposition (IA-PLD) have been employed to deposit carbon nitride films. Crystalline C-N films composed of α- and β-C 3 N 4 , as well as some unpredicted C-N solids have been synthesized on Ni(100) substrates via HFCVD using a gas mixture of nitrogen and methane. The crystal constants of the...
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