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In this work, ultrathin layers of GdOx, NbOx and GdNbOx, deposited with ACSD have been investigated. Because of the high temperature anneals utilized in the process flow of electronic devices, interactions of the deposited high-k materials and the substrate are analyzed. The deposited layers of GdOx, NbOx and GdNbOx on SiO 2 and Al 2 O 3 are annealed in an oxidizing and inert...
Zirconia ultrathin films were deposited by aqueous chemical solution deposition, using citratoperoxo-Zr(IV) precursors with different citric acid content. The precursor synthesis, thermal decomposition and crystallization of oxide powders were studied. This showed an effect of the citric acid content in every stage. The precursors were applied for the deposition of uniform, ultrathin films (<30 nm...
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