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The ozone etching of thin films of a commercial polystyrene-polyisoprene-polystyrene (PS-PI-PS) triblock copolymer (Vector 4111) was studied using atomic force microscopy (AFM) and ellipsometry. The major phase of the copolymer consists of PI (82 wt.%) and the copolymer forms a cylindrical structure upon annealing. Moderate ozone doses (1.4% wt/wt) were used to etch the copolymer. This revealed two...
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