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ZnO thin films were fabricated on Si (111) substrates by oxidation of metallic Zn films in air. A thin layer of Au was used to enhance the adhesion of the Zn atoms to the Si surface during depositing the Zn films on the substrates at room temperature (RT) by thermal evaporation. X-ray diffraction (XRD) studies indicate that the ZnO film prepared at 500 o C has better crystalline quality than...
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