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We report on the fabrication of completely uniform monolayer graphene on a metal thin film over a 150mm Si substrate at a low temperature of 600°C by inductively coupled plasma-enhanced chemical vapor deposition (ICPCVD). Through novel use of bimetallic catalyst such as CuNi and AuNi alloys we were able to control catalytic reaction at the metal surface and grow complete monolayer graphene with a...
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