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Stress-induced martensitic transformation of as-sputtered and post-annealed Ti 50.1 Ni 40.8 Cu 9.1 thin films was investigated using in-situ synchrotron X-ray diffraction (S-XRD) technique. For the as-deposited film, in-situ S-XRD analysis showed a martensitic transformation from parent phase to martensite during initial loading, followed by reorientation of martensite variants...
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