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Inorganic-solid-state electrolyte tantalum oxide thin films were deposited by reactive DC magnetron sputtering to improve the leakage and deterioration of traditional liquid electrolytes in electrochromic devices. O 2 at 1–20sccm flow rates was used to deposit the tantalum oxide films with various compositions and microstructures. The results indicate that the tantalum oxide thin films were...
Ti 1-x Al x N films have been grown onto Si(100) substrate by d.c. reactive magnetron sputtering as a diffusion barrier between Cu and Si. The residual stresses of Ti 1-x Al x N films depended on the microstructure and composition. Higher residual stresses were obtained for Ti 1-x Al x N films deposited with higher bias...
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