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Nitrogen ions (N 2+ ) with 62keV were implanted into the as-deposited Ti film composed of mainly (110)-oriented TiH x and (03·5)-oriented hcp-Ti at room temperature, which results in the epitaxial formation of (110)-oriented and (001)-oriented TiN y , respectively. The electron energy loss spectroscopy experiments elucidate that in the early N-implanting stage the release...
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