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In this work, memory devices integrating a double layer of silicon nanocrystals as trapping medium and a high-k HfAlO-based control dielectric are presented. We will show that the use of two stacked Si-nc layers significantly improves the memory window compared to the single Si-nc layer devices, without introducing dispersions on the charging dynamics. Then, we also evaluate the potentiality of hybrid...
The integration of silicon nanocrystal (Si-nc) nonvolatile memory (NVM) arrays with HfAlOx based interpoly dielectric (IPD) is presented for the first time. The data obtained on array vehicles programmed in Fowler-Nordheim operation regime are in excellent agreement with previously presented results on single cells, as well as theoretical data and allow the evaluation of the scalability of the Si-nc...
In this paper we show for the 1st time that Silicon nanocrystal (Si-ncs) memories with high-k (HfO2, Al2O3 and HfAlO) interpoly dielectrics (IPD) can offer excellent behaviour in the Fowler-Nordheim regime, with great relevance for future sub-45 nm NAND memory generations. We significantly advance the state-of-the-art by showing a strict correlation between the different IPD properties and the performance...
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