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In this paper, we have examined the possibility of using a planar negative index lens in lithography applications.We numerically studied the field patterns generated by a PEC and Cr mask propagating through a negative index slab to form a super-resolved image of the mask at the image plane. We discuss the advantages and disadvantages of this for next generation lithography.
We examine the possible use of a planar negative index superlens to recover subwavelength scale information about a three dimensional penetrable object. In particular, we analyze the role of the amplified evanescent waves and show that it may not be possible to get high resolution in three dimensions from one experiment. There is trade-off between the transverse and longitudinal resolution one can...
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