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Trigger voltage walk-out phenomenon is found in SOI LIGBT’s under repetitive ESD stresses. Such a characteristic would cause an IC to be susceptible to the risk of exceeding the ESD design window and thus resulting in core circuit damages when the LIGBT is served as an ESD protection device in the SOI process. This trigger-voltage walk-out phenomenon is investigated in this paper, and both the experimental...
Researches on the electrostatic discharge (ESD) performance of drain-extended NMOS (DeNMOS) under the state-of-the-art 28nm and 40nm bulk CMOS process are performed in this paper. Three distinguishing phases of avalanche breakdown stage, depletion region push-out stage and parasitic NPN turn on stage of the gate-grounded DeNMOS (GG-DeNMOS) fabricated under 28nm CMOS process measured with transmission...
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