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Titanium‐Tantalum coatings are deposited by magnetron co‐sputtering technique, using independently driven titanium and tantalum targets. The effect of the Ta content on the structure, mechanical, and wear properties of Ti films is investigated. It is found that the percentage of the added Ta varies linearly from 3.7 to 31.3 at% by increasing the power applied to the Ta target from 10 to 100 W. The...
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