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We experimentally demonstrate a subwavelength refractive index engineered nanostructure for edge coupling, enabling a coupling efficiency of −0.4 dB and polarization independent operation for a broad spectral range exceeding 100 nm.
We propose an original two-mode (TE0/TE1) division multiplexer using a taper-etched directional coupler. The multiplexer has a low insertion loss of −0.1 dB within C-band with a minimum loss of −0.05 dB, a modal crosstalk below −40 dB and a robust fabrication tolerance (>100 nm).
The coupling efficiency of a surface grating coupler is optimized for a an arbitrary buried oxide thickness by adjusting the grating radiation angle. The coupler is apodized using a subwavelength structure, allowing a single etch step fabrication. The measured coupling loss is −2.16dB with 3dB bandwidth of 64nm, for a minimum feature size of 100nm. It is also shown by simulations that by implementing...
Silicon-on-insulator (SOI) is considered the most promising high-index-contrast waveguide platform for fabricating microphotonic devices with high integration density. However, there are fundamental challenges with this waveguide system related to the fixed values of the refractive indices of the constituent materials (Si and SiO2). In this paper, we present a method that can potentially circumvent...
<para> Single mode silicon-on-insulator rib waveguides offer a weak lateral confinement, which makes it difficult to design high-performance multimode interference couplers (MMIs) based on these waveguides. Here, a complete design procedure for single etch step MMIs with tapered rib access waveguides is presented, which yields low excess loss (0.1 dB) and good imbalance (0.02 dB). Furthermore,...
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