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La2Ni3, LaNi2, LaNi3 and LaNi5−xAlx (x=0.2,0.5,1) alloy thin films were prepared onto oxidised Si(100) substrates in the temperature range of 285–700K using a computer-controlled ultra high vacuum (UHV) magnetron co-sputtering. Structural studies showed that the samples deposited at 295K are nanocrystalline with average grain size D∼15–20nm. Thin films deposited at about 700K are polycrystalline with...
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