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Since the successful introduction in the Western economic area of Atomic Layer Epitaxy (ALE) by Suntola's team [1] the technique more extensively known as Atomic Layer Deposition (ALD) has been slowly gaining acceptance in the field of thin film deposition [2]. There are many benefits of ALD, however, in terms of deposition rates and management of reactive gas species in complex 3D structures (such...
One of the great hopes for HIPIMS applications was their potential use and adoption by the semiconductor industry. Production of highly ionized particles has been of interest for deep in-trench filling as ionized particles can be directed by an electric field down the deep trench. However the technological reality is that the semiconductor industry has not been enthusiastic about this approach. The...
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