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In this work we present the influence of in situ deposited non-continous SiN layer and the chemical precursors III/V mole ratio change during GaN buffer growth for AlGaN/GaN/Si(111) heterostructures with low temperature AlN interlayer on their crystalline quality and electrical mobility of two dimensional electron gas (2DEG). We show, that application of SiN layer resulted in a decrease of (0002)...
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