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The study on amorphous hydrogenated silicon carbonitride (a‐SiCN) thin film coatings produced by remote plasma chemical vapor deposition from 1,1,3,3‐tetramethyldisilazane as single‐source compound is reviewed. The RP was generated using three extreme compositions of the H2 + N2 upstream‐gas mixture with a different nitrogen content CN2 = [N2]/([H2] + [N2]). The films were deposited using plasma generated...
Our study on amorphous hydrogenated silicon carbonitride thin films produced by remote plasma chemical vapor deposition (RP‐CVD) from 1,1,3,3‐tetramethyldisilazane as a single‐source compound using the H2 + N2 upstream‐gas‐mixture for generation of microwave plasma are reviewed. The effect of nitrogen content in the H2 + N2 mixture fed to a plasma on the rate and yield of the RP‐CVD process, chemical...