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We have fabricated the Cu (50nm)/Nb–Ni (5nm)/Si heterostructures, annealed at various temperatures up to 800°C in a high vacuum system, to investigate the barrier performance of the ultrathin amorphous Nb–Ni film between Cu and Si. No impurity peaks are observed from the X-ray diffraction patterns of the Cu/Nb–Ni/Si heterostructures annealed up to 800°C. The island-like surface is observed for the...
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