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(Ga,Mn)As magnetic semiconductor quantum dots were fabricated on Si(001) substrates by droplet epitaxy using molecular‐beam epitaxy. It is found that both the diameter and density of the (Ga,Mn)As quantum dots can be modulated by changing the amount of Ga deposited. The high‐resolution transmission electron microscopy image shows that the dots possess a zincblende structure. The presence of ferromagnetic...
A new universal stress retardation parameter set is successful to account for initial oxidation rate enhancement, orientation-dependent retardation and self-limiting phenomena observed in the dry oxidation experiment of the silicon FIN nanostructures over a wide temperature range. This stress-retarded orientation-dependent model was proved to be trustworthy in shape engineering of silicon nanowire...
In this work the charge-based capacitance measurement (CBCM) method has been extended and calibrated to measure sub-fF level bias-dependent capacitance of single channel silicon nanowire (SNW) transistors. Mixed mode simulations are used to establish the efficacy of the method. Test keys have been carefully designed and fabricated on-chip so that C-V and I-V characteristics are measured on the same...
Charge trapping and wearout characteristics of self-aligned enhancement-mode GaAs nMOSFETs with silicon interface passivation layer and HfO2 gate oxide are systematically investigated at various time scales (from micro-seconds to seconds). Unlike high-kappa on silicon devices, both bulk trapping and interface trapping affect the PBTI (positive bias temperature instability) characteristics of nMOSFETs...
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