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The frequency dependence of capacitance-voltage (C-V) characteristics of Hg/GaN and Hg/InGaN/GaN Schottky contacts are investigated for 1KHz, 10KHz and 1MHz at room temperature. An anomalous peak in the C-V curves of Hg/GaN sample is observed but no peak for the Hg/InGaN/GaN sample occurs. The interface states, series resistance and minority-carrier injection would be the origin of this anomalous...
The performance and reliability of ZrO2/In0.53Ga0.47As MOSFETs are shown to be improved by simultaneous reduction of dielectric and interface charges. An amorphous (La)AlOx interlayer at the ZrO2/In0.53Ga0.47As interface is a key to reduce border traps, interface traps and move ZrO2 fixed charge away from the In0.53Ga0.47As. Border traps are reduced ~3x, effective fixed charges are reduced ~3x and...
This paper compares device performance for In0.53Ga0.47As MOSFETs using single HfO2 gate dielectric with stacked gate dielectrics using various interfacial layers between HfO2 and In0.53Ga0.47As substrate including Al2O3, HfAlOx, LaAlOx, and LaHfOx. Of the gate stacks studied, Al2O3/HfO2, HfAlOx/HfO2, and LaAlOx/HfO2 bilayer gate dielectrics exhibit lower subthreshold swing, higher drive current and...
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