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Cluster SIMS, employing an SF5+ polyatomic primary ion sputter source, in conjunction with a Bi3+ analysis source, was utilized to depth profile through poly(methylmethacrylate) (PMMA) thin films (approximately 140 nm) of variable tacticity. The damage characteristics of the stereospecific PMMA films under SF5+ bombardment were measured as a function of temperature in the range of − 75 °C–150 °C....
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