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Corrosion inhibitors in copper slurries play a quite important role in copper chemical mechanical polishing. Besides widely used benzotriazole (BTA), 1,2,4-triazole has been demonstrated to be another promising copper inhibitor. In this paper, the properties of 1,2,4-triazole were well investigated compared with BTA. It is revealed that 45mM 1,2,4-triazole can achieve equivalent chemical protection...
In this paper, as a representative of the polyamines, Trilon® P was used as a critical additive in copper slurries to improve the copper chemical mechanical polishing (CMP) performance, and high copper removal rate (RR), low copper static etching rate (SER), low dishing and low dielectric erosion were realized by CMP tests on the copper patterned wafers. The chelating reactions between Trilon® P and...
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