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A physical co-sputter deposition process under a relevant working gas pressure condition was used to produce a multi-component thin film with a longitudinally self-organized microstructure. In this paper, Co–Si–O thin films were prepared by radio frequency (RF) magnetron sputtering, and their growth structures were studied by means of SEM, TEM, XRD and XPS. The microstructural changes in the Co–Si–O...
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