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Capillary discharge plasmas have been widely used as electrothermal chemical (ETC) launch devices, fusion reactor pellet injectors and high heat flux sources for material studies. In the electro thermal chemical launcher, the mechanisms of the plasma-propellant interaction are critical, with many factors being of potential importance. In particular, the role of plasma radiation is disputed. We will...
Latch-up free CMOS circuit operation is achieved through the use of buried polysilicon diodes instead of conventional (ohmic) well contacts. In a DRAM technolgy with polysilicon bit line a buried polysilicon diode can be realized with no additional process step and no additional die area is required. No degradition of MOS device parameters occurs. The basis for experiment is a 4M DRAM 0.9??m n-well...
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