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This study aims to understand the microstructural behavior of nitriding compound layer and its effect on Nb-carbonitride growth produced by the thermo-reactive diffusion (TRD) process. Gas nitriding was performed at 550 °C for 3 and 6 h, followed by TRD at 900 °C for 6 h. The nitriding compound layers had thicknesses of 10 and 16 μm for nitriding time of 3 and 6 h, respectively. The corresponding...
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