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The radiation damage caused by low energy r.f. plasmas has not been, to our knowledge, studied so far in the case of symmetric planar plasma reactors that are usually used for PECVD processes. The reason is that, unlike nonsymmetrical RIE reactors, such geometry prevents, basically, high-energy ion bombardment of the substrate. In this work, we present the results of experiments in which we have studied...
The aim of this work is the experimental study of potential possibilities of oxidation in r.f. (13.56 MHz) plasma application for the formation of ultrathin (<10 nm) oxide layers.
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