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Al–Si–N coatings were deposited on tungsten carbide (WC–Co) and silicon wafer substrates using Cr and AlSi (12at.% Si) alloy targets using a dual cathode source with short straight-duct filter in the cathode arc evaporation system. Al–Si–N coatings were synthesized under a constant flow of nitrogen, using various substrate bias voltages at a fixed AlSi cathode power. To enhance adhesive strength,...
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