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In the past decade nanoimprint has been developed to a serious alternative for next generation lithography (NGL). In this work, the most recent developments of UV-nanoimprint Lithography (UV-NIL) with special emphasis to the work accomplished at AMO and the IHT-RWTH Aachen are reviewed and functional applications demonstrated. Further the potentials of various UV-NIL concepts are evaluated and possible...
The development of UV-Nanoimprint Lithography (UV-NIL) in the last decade is reviewed with special emphasis to collaborative efforts of the Institute of Semiconductor Electronics (IHT) of the RWTH Aachen and the AMO GmbH. Strategic consideration for certain technical decisions are presented and a realistic analysis of further prospects is performed based on firm data obtained up to now.
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