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Cuprous oxide (Cu2O) films were electrodeposited on Ni/Si(100), Au/Si(100), and Si(100) substrates from aqueous solution at room temperature. The thicknesses of the films were varied in the range of 250 to 1250nm. It was shown that at pH 10.00, an increase of just 1% can change the Cu2O texture from [100] to [111]. Atomic force microscopy reveals that Cu2O(100) and Cu2O(111) films present rounded...
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