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We have developed a new fabrication process of three-dimensional photonic crystal (3DPC) structures using the self-aligned two-directional electrochemical etching method. We performed optical measurements to clarify the properties of the fabricated 3DPC structures and observed a decrease in the reflectance. We also observed for silicon nanocrystals deposited on the 3DPC structures that the photoluminescence...
We have reported periodic pore formation with diameter in 80 nm and aspect ratio above 250 on N+(100) silicon substrate and demonstrated the fabrication of silicon 3-dimensional microstructures by applying double directional etchings method.
Broadband variable chromatic dispersion in C-band frequency range is demonstrated using novel nanostructured electro-optic waveguide consisting of low-loss Si3N4 rectangular core and Si/SiO2 two-dimensional photonic-crystal layer controlled by voltage bias
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