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MBE growth of InP-based HBTs on GeOI/Si substrates is described. A GaAs buffer is nucleated on the GeOI; then a graded InAlAs metamorphic buffer transitions the lattice constant to InP. TEM shows minimal anti-phase boundaries and limited dislocations propagating into the device layers. Large area DC parameters are similar to LM HBTs grown on InP. Small area devices exhibit peak current gain cutoff...
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