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The intrinsic properties of silicon (Si) make it an excellent material for integrated photonics devices with small footprints [1]. To date, most of the reported devices have been based on crystalline silicon (c-Si), but this material suffers from difficult integration with electronic layers due to fabrication constraints. Subsequently, there has been growing interest in alternative forms of Si, such...
Polycrystalline silicon (poly-Si) has attracted significant interest in the area of silicon photonics because of its potential for combining good optical transmission, electronic functionality and low fabrication cost, which makes it an attractive material for commercial applications [1]. In addition, it was shown recently that by laser processing of amorphous Si (a-Si) it is possible to obtain very...
Wafer scale testing is critical to reducing production costs and increasing production yield. Here we report a method that allows testing of individual optical components within a complex optical integrated circuit. The method is based on diffractive grating couplers, fabricated using lattice damage induced by ion implantation of germanium. These gratings can be erased via localised laser annealing,...
Localized laser heating of amorphous Si deposited on LiNbO3 results in crystallization of the Si over-layer and the formation of a waveguide in the LiNbO3 substrate that supports guided modes in the visible and IR.
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