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Cu thin films were deposited on Si(111), glass, and quartz substrates by magnetron sputtering. X‐ray diffraction, SEM, and photoemission electron microscope studies were carried out to characterize the films. An influence of the nature of substrate on the Cu2O and CuO phases formed was observed. Copper silicide formation in case of silicon substrates aided in formation of Cu2O rather than CuO unlike...
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