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We have explored the feasibility of using negative epoxy novolak-based SU-8 2002 resist as an electron beam lithography resist for ultra high speed fabrication of large areas of high resolution patterns. 75 nm-wide lines have been obtained in thin-layered SU-8 films, using a 50 keV electron beam system, and the required exposure dose was found to be around 3.6 μC/cm 2 , which is more than...
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