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While the potential of FinFETs for large-scale integration (LSI) was demonstrated before on relaxed device dimensions, in this paper we present performance data of aggressively scaled transistors, ring oscillators and SRAM cells. FinFET SRAMs are shown to have excellent VDD scalability (SNM=185 mV at 0.6 V), enabling sub-32 nm low-voltage design.
In this paper recent advances in multi-gate MOSFET (MuGFET) circuit design are reported. The feasibility of essential parts of low-power mobile SoC applications and large scale integration capability is shown. Excellent short channel control enables undoped metal gate MuGFETs to outperfom their planar counterparts in terms of delay-leakage trade-off. Superior voltage scaling efficiency and competitive...
Energy dissipation, performance, and voltage scaling of Multi-Gate FET (MuGFET) based CMOS circuits are analyzed using product-representative test circuits composed of 10 k devices. The circuits are fabricated in a low power MuGFET CMOS technology, achieve clock frequencies of 370-500MHz at VDD=1.2V, and operate down to the subthreshold region. Voltage scalability of MuGFET circuits is superior to...
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