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Freestanding GaN crystals were fabricated by hydride vapor phase epitaxy using a random-islands facet-initiated epitaxial overgrowth technique. In this method, small micrometer sized GaN islands were firstly deposited on a TiC buffer layer on a sapphire substrate. Successive three-dimensional growth of GaN was controlled to a thickness of a few hundred micrometers on the buffer layer. Finally, a thick...
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