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TiO2 were deposited by using one of the sol-gel methods, the spin coating method. The speed of the spin coater used can be adjusted up to 8000rpm, but in this study only 1000rpm, 2000rpm and 3000rpm was used. There are 3 level of speed with different annealing temperature to provide a fine differentiation in between each parameter. These parameters will be characterized by current-voltage (I–V), Atomic...
TiO2:ZnO nanostructures thin films have been fabricated on glass substrates via sol-gel spin-coating technique for deposition of TiO2 seed layer and solution-immersion method for growth of ZnO nanostructures. The layer of TiO2 were annealed at various temperatures ranging from 350 to 500°C for 2 hours to examine the effect of annealing TiO2 seed on the growth of ZnO nanostructures. The surface topography...
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