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Process window centering (PWC) is an efficient methodology to validate or adjust and center the overall process window for a particular lithography layer by detecting systematic and random defects. The PWC methodology incorporates a defect inspection and analysis of the entire die that can be automated to provide timely results. This makes it a good compromise between focus exposure matrix, where...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.