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W-containing carbon coatings were deposited on plain carbon steel and titanium substrates by Combined Magnetron Sputtering and Ion Implantation (CMSII) technique. A target made of fine grain graphite with cylindrical tungsten pins mounted in the area of maximum sputtering rate was used. High voltage pulses (−30kV, 20μs, and 25Hz) were superposed over the DC bias. By adjusting the processing parameters...
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