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The deposition of SnO 2 using a 120-W high power diode laser (HPDL) on both fused silica and soda-lime–silica glass has been successfully demonstrated. Deposition on both glass substrates was carried out with laser power densities of 650–1600 W cm −2 and at rates of 420–1550 mm min −1 . The thickness of the deposited layers was typically approximately 250 μm. The maximum theoretical...
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