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A compact shallow etched distributed diffraction grating waveguide demultiplexer has been demonstrated in silicon-on-insulator for coarse wavelength demultiplexing applications. The device supports 4 channels with 20nm channel spacing.
We show that it is possible to significantly reduce the side lobe level and the noise floor of the etched grating demultiplexer by as much as 20 dB and 19 dB respectively by apodizing the reflection response. This is possible because the tasks of dispersion and reflection are separated in these devices.
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