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Multi-layer carbon nitride (CNx) films have been deposited onto Si (100) substrates by repeated process of DC magnetron sputter-deposition and nitrogen ion beam (N+/N2+) implantation. The composition, bonding structure and mechanical properties of multi-layer CNx films prepared by the repeated process were investigated. Depth profile studies by X-ray photoelectron spectroscopy (XPS) showed that it...
In this article, titanium oxide films were prepared by ion beam enhanced deposition where titanium was evaporated by electron beam and simultaneously bombarded with xenon ion beams at an energy of 40 keV in an O 2 environment. X-ray photoelectron spectroscopy and Auger electron spectroscopy were used to research the chemical state and composition of the titanium oxide films. The results show...
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