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Carbon thin films for electron cloud mitigation and anti-multipacting applications have been prepared by dc magnetron sputtering in both neon and argon discharge gases and by plasma enhanced chemical vapour deposition (PECVD) using acetylene. The thin films have been characterized using Secondary Electron Yield (SEY) measurements, Scanning Electron Microscopy (SEM), Nuclear Reaction Analysis (NRA)...
In order to reduce the activation temperature of the TiZrV alloy, thin films of various compositions were produced by three-cathode magnetron sputtering on stainless-steel substrates. For the characterisation of the activation behaviour the surface chemical composition has been monitored by Auger electron spectroscopy (AES) during specific in situ thermal cycles. The volume elemental composition of...
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