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The anisotropic characteristics of an iron silicide (Fe3Si) epitaxial thin magnetic film grown on a Si(111) silicon vicinal surface with a misorientation angle of 0.14° have been measured by the ferromagnetic resonance method. It has been shown that the polar and azimuth misorientation angles of the crystallographic plane of the substrate can be determined simultaneously from the angular dependences...
The results of the structural and magnetic studies of the epitaxial structure prepared during the simultaneous evaporation from two iron and silicon sources on an atomically pure Si(111)7 × 7 surface at a substrate temperature of 150°C have been presented. The epitaxial structure has been identified as a single-crystal Fe3Si silicide film with the orientation Si[111]‖Fe3Si[111] using methods of the...
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