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Co/Cu multilayer films were prepared by rf sputtering, both with and with-out a substrate bias voltage VB=??30 V. X-ray diffraction results indicated that the layer boundaries in ??30 V biased films are sharper, and the orientation of (111) planes are better, than in films prepared without a bias voltage. In films with zero bias, the MR ratio increases monotonically with the Cu layer thickness dCu...
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