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Although ZnO and ZnS are chemically and structurally similar, these binary compounds do not form a solid solution at room temperature for all proportions of sulfur (S) and oxygen (O) due to solubility limits of S in ZnO and O in ZnS in equilibrium states. To fabricate ZnO1−xSx thin films with 0<x<1, films were intentionally deposited in a non-equilibrium state using pulsed laser deposition while...
Recently, the application of ZnO thin films as an active channel layer of transparent thin film transistor (TFT) has become of great interest. In this study, we deposited ZnO thin films by atomic layer deposition (ALD) from diethyl Zn (DEZ) as a metal precursor and water as a reactant at growth temperatures between 100 and 250 °C. At typical growth conditions, pure ZnO thin films were obtained without...
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