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An advanced lithographic technique which is based on direct writing of thin films by hard X‐rays has been developed. Silica hybrid organic–inorganic films have been deposited by radio frequency plasma‐enhanced chemical vapour deposition and have been patterned using deep X‐ray lithography with synchrotron light. The exposure to high energy photons removed the organic groups in the films and induced...
Front Cover: Silica thick films deposited by PECVD have been patterned using deep X‐ray lithography in a process allowing fast writing of the films. This patterning technique is based on the selective removal of the organic species induced by X‐rays and local densification of the exposed regions. Further details can be found in the article by S. Costacurta, L. Malfatti, A. Patelli, P. Falcaro, H....
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